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| 題 名 | Defect Density Extraction of high-κ Dielectric Gate Stack by Combining Charge Pumping and Low Frequency Measurement |
|---|---|
| 作 者 | 吳建宏; | 書刊名 | Chung Hua Journal of Science and Engineering |
| 卷 期 | 7:3 2009.09[民98.09] |
| 頁 次 | 頁79-83 |
| 分類號 | 448.552 |
| 關鍵詞 | high-κ dielectric; HfSiON; Charge pumping; Low frequency noise; |
| 語 文 | 英文(English) |