頁籤選單縮合
題名 | The Behaviors of a Stabilizer in an NITD System with Electroless Nickel Plating=非均溫化學鎳析鍍系統中之穩定劑行為 |
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作者 | 宋鈺; 葛明德; | 書刊名 | Journal of the Chinese Institute of Chemical Engineers |
卷期 | 34:5 2003.09[民92.09] |
頁次 | 頁531-538 |
分類號 | 472.16 |
關鍵詞 | 非均溫化學鎳析鍍系統; 非均溫化學鍍系統; Electroless plating; Non-isothermal deposition; Stabilizer; Laser light scattering; Precipitate; |
語文 | 英文(English) |
中文摘要 | 本研究發展出一種異於傳統方法之非均溫化學鍍系統,利用局部加熱裝置,此系統不僅可增加化學鍍沈積速率,且同時能維持鍍液之穩定性。本文主要在探討穩定劑於化學鎳析鍍系統中之行為,藉由電化學混合電位理論與鍍液穩定性之實驗,來比較穩定劑在均溫以及非均溫系統中之效應,並對非均溫化學鎳系統特有之反應機制,提出初步之解釋。 |
英文摘要 | A novel non-isothermal deposition (NITD) system is developed for electroless plating in this work. This developed system is capable of enhancing the bath deposition rate and stability simultaneously. Although the deposition rate is in opposition to bath stability in a traditional EN system, this conflict is resolved by the developed NITD system. In this study, the effect of the stabilizer on the performance of the NITD electroless nickel (EN) system is investigated, and a mechanism is proposed to explain the outstanding characteristics of the NITD system such that bath stability remains unchanged as the deposition rate increases in the absence of a stabilizer. Bath stability is determined through observation of the precipitate using both laser light scattering and naked eye. |
本系統之摘要資訊系依該期刊論文摘要之資訊為主。