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題 名 | 遮蔽與添加法之X 射線螢光分析 |
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作 者 | 陳振揚; | 書刊名 | 技術學刊 |
卷 期 | 3:2 1988.06[民77.06] |
頁 次 | 頁153-158 |
分類號 | 343.318 |
關鍵詞 | X射線; 添加法; 遮蔽; 螢光分析; |
語 文 | 中文(Chinese) |
中文摘要 | X射線螢光分析 (X-ray fluorescence analysis或XRF analysis) 之定量以檢量線法與標準添加法之使用最為普遍,但檢量線法常因標準試片難求,以及試時中共存成分之干擾,而必須從事各種繁雜之補正工作,標準添加法也因背景之影響以及共存成份之干擾難獲如意之結果。遮蔽與添加法 (masking and addition method) 可稱MA法,為筆者設計之X射線螢光分析新法,此法綜合運用了試片扇面曝露之遮蔽法與試料之標準添加法,因而改變了試片在X射線照射下之曝露面積與組成濃度,就XRF強度在同等之干擾成份之母體效應 (matrix effect) 與背景強度 (back ground intansity) 之情況下作定量分析,新法使XRF之分析更簡易。 |
英文摘要 | Conventional quantitative X-ray flourescence analysis, XRF, uses calibration curves and standard addition. The diffiulty in getting standard samples and the troublesome correction procedure due to the interferences of the coexistent components limit the needed calibration curve. Interferences from the background and use of the coexistent components limit also the usage of the standard addition method. The masking and addition method, MA method, is proposed. It is generalized method of the sector masking and the standard addition methods. The exposure surface and the sample concentration can both be changed with the method. Therefore, sample may be analyzed under the same matrix effect and background intensity. The new method is convenient for XRF analysis. |
本系統中英文摘要資訊取自各篇刊載內容。