頁籤選單縮合
| 題 名 | Diffraction Limit for a Circular Mask with a Periodic Pinhole Array |
|---|---|
| 作 者 | Yang,Gwo-Huei; Hwang,Hone-ene; Han,Pin; | 書刊名 | Chinese Journal of Physics |
| 卷 期 | 40:6 2002.12[民91.12] |
| 頁 次 | 頁594-604 |
| 分類號 | 337 |
| 關鍵詞 | |
| 語 文 | 英文(English) |
| 英文摘要 | Most investigations of masks with periodic apertures in the literature are limited only to far-field diffraction, and they did not take the degraded quality of the shaped image due to the translation effect among small apertures (pinholes) into account, or the mathematical derivation which was used to analyze these problems is too complicated. The results of such studies were not sufficiently concrete, and they also failed to satisfy the rules for a photo mask design. This paper offers a quick and precise method to analyze the ``blurring" generated by the translation effect of a small aperture (pinhole). It points out that the applicable conditions for image shaping of a circular pinhole in a circular mask should be redefined by a theoretical understanding of the near-field effect; additionally it provides certain embodied and useful reference rules for the design of a mask with a pinhole array. |
本系統中英文摘要資訊取自各篇刊載內容。