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題名 | 同步輻射插件磁鐵真空腔之研製與安裝=Development and Installation of the Vacuum Chambers for the Insertion Devices at the Synchrotron Radiation Research Center |
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作者 | 張世汯; 許瑤真; 熊高鈺; 王端正; 許憲能; 魏文熙; 蕭可明; 林再福; 翁宗賢; 陳俊榮; Chang, S. H.; Hsu, Y. J.; Hsiung, G. Y.; Wang, D. J.; Hsu, S. N.; Wei, W. H.; Hsiao, K. M.; Lin, T. F.; Ueng, T. S.; Chen, J. R.; |
期刊 | 真空科技 |
出版日期 | 20000900 |
卷期 | 13:3 2000.09[民89.09] |
頁次 | 頁48-54 |
分類號 | 339.495 |
語文 | chi |
關鍵詞 | 插件磁鐵真空腔; 聚頻磁鐵真空腔; 電子儲存環; |
中文摘要 | 自1995年W20增頻磁鐵真空腔和U5、EPU5.6、U9聚頻磁鐵真空腔已陸續安裝在臺灣光源上,這些真空腔內部的結構包含一個電子束橢圓軌道腔和條狀NEG幫浦抽氣腔,再以兩組經熱處理的鈹銅彈簧吸收條狀NEG幫浦在活化過程中的熱膨脹,鈹銅彈簧高溫時的性質與組裝於真空腔的真空腔的真空特性也已測試完成。而這些聚頻磁鐵真空腔除了長度與抽氣系統幾何結構外,其它基本設計幾乎相同,我們將描述比較這些聚頻磁鐵真空腔在電子儲存環中真空特性的差異。 |
英文摘要 | The vacuum chambers for insertion devices of a Wiggler, W20, and the Undualtors, U5, EPU5.6, U9, etc. have been installed at Tawian Light Source (TLS) since 1995. The inner aperture of these chambers comprise of an elliptical channel for electron beam and pumping channel for a nonevaporable getter (NEG) strip. Two heat-treated Be-Cu springs were used to absorb the thermal expansion of the NEG strip during activation. The high temperature properties of the Be-Cu springs and the vacuum performance of the complete chamber have been tested. The basic designs in these Undulator chambers are almost the same except the length and the geometry of pumping systems. The comparison of vacuum performance of these Undulator chambers in the electron storage ring will be described. |
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