查詢結果分析
來源資料
相關文獻
- YIG(Y[feb0]Fe邚O[feba])靶材之製作
- 以脈衝雷射蒸鍍YIG(Y[feb0]Fe忦O[feba])薄膜
- 脈衝雷射在矽單晶上的熱處理
- 噴霧焙燒氧化鐵粉之粒徑評估
- The Growth Process and Characterization of Y[feb5]Ba[feaf]Cu[feb0]O Superconducting Thin Films
- SiO[feaf]-CaO-FeO等熱力學性質之模擬分析
- 鐵鹽膠羽混凝除砷之探討
- Experimental Design for the Treatment of a Dyeing/Finishing Wastewater by FBR-Fenton Method
- 中鋼氧化鐵粉特性及軟磁應用
- 噴霧焙燒氧化鐵粉之生產及粒徑特性研究
頁籤選單縮合
題名 | YIG(Y[feb0]Fe邚O[feba])靶材之製作=The Making of YIG(Y[feb0]Fe邚O[feba]) Targets |
---|---|
作者姓名(中文) | 錢玉涵; 陳錦昌; 江文中; | 書刊名 | 華岡理科學報 |
卷期 | 18 2001.05[民90.05] |
頁次 | 頁99-109 |
分類號 | 440.34 |
關鍵詞 | 脈衝雷射; 靶材; 氧化釔; 氧化鐵; X-光繞射分析; YIG; Pulsed laser deposition; PLD; Target; Yttrium oxide; Iron oxide; X-ray diffraction analysis; |
語文 | 中文(Chinese) |
中文摘要 | YIG (Y3Fe5O12)為磁光元件與磁記憶等科技之重要材料,其中尤以薄膜型式應用最為廣泛。YIG薄膜常以脈衝雷射(pulsed laser deposition,簡稱PLD)方式製備,而鍍膜所需的靶材(target),是以高溫燒結氧化釔與氧化鐵的均勻混合物而成。本文詳述YIG靶材的製作過程,包括原料、原料的配置、混合與研磨、高壓製靶的經過、燒結的條件和程序,以及成品分析等。粉末X-光繞射分析顯示燒結之後的靶材確為Y3Fe5O12;而以脈衝雷射鍍製於GGG(111) (Gd3Ga5O12)基板上之薄膜,經X-光繞射分析後,確認為YIG(111)。 |
英文摘要 | YIG (Y3Fe5O12) is a garnet material with broad applications in magneto-optical and memory devices, and the use is particularly important in the form of thin films. YIG thin films are frequently prepared by Pulased Laser Deposition (PLD). The YIG targets used for deposition are synthesized by sintering yttrium oxide and iron oxide at high temperature. This paper describes the detailed procedures of YIG target making, including the raw materials, the proportionality, mixing and grinding of the materials, target pressing, high temperature synthesis, and the product analysis. Powder X-ray diffraction measurement confirms that the final product is indeed Y3Fe5O12. XRD scans on the films deposited by PLD onto GGG(111)(Gd3Ga5O12) substrates show the films are YIG(111). |
本系統之摘要資訊系依該期刊論文摘要之資訊為主。