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題 名 | Chemical Vapor Deposition of SnO[feaf]Thin Films from Bis(β-diketonato)tin Complexes |
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作 者 | 吉凱明; 林嘉祺; 呂雅惠; 廖儒修; | 書刊名 | Journal of the Chinese Chemical Society |
卷 期 | 47:3 2000.06[民89.06] |
頁 次 | 頁425-431 |
分類號 | 461.5 |
關鍵詞 | β-diketonato complexes of tin(Ⅱ); Chemical vapor deposition; SnO[feaf]film; |
語 文 | 英文(English) |
英文摘要 | A series of bis(��-diketonato)tin compounds have been systematically synthesized and examined as precursors for chemical vapor deposition of SnO2 thin films. These complexes were characterized by elemental analyses and NMR, IR and mass spectroscopic methods. X-ray single-crystal determination of Sn(tfac)2 reveals that the complex possesses a distorted trigonal bipyramidal structure. The SnO2 films can be deposited on the substrates such as silicon, titanium nitride, and glass by using Sn(hfac)2, Sn(tfac)2 and Sn(acac)2 as CVD precursors at deposition temperatures of 300-600 oC with a carrier gas of O2. The deposition rates range from 20 to 600 A/min. Deposited films have been characterized by XRD, SEM, AFM, AES and AAS analyses. |
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