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題名 | 脈衝磁控濺射電致色變薄膜特性研究=Investigation of the Electrochromic Thin Film by Pulse Sputter Process |
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作者 | 翁克偉; 黃俊杰; 卓逸誠; Weng, Ko-wei; Huang, Jung-jie; Cho, Yi-cheng; |
期刊 | 遠東學報 |
出版日期 | 20120600 |
卷期 | 29:2 2012.06[民101.06] |
頁次 | 頁173-179 |
分類號 | 448.5 |
語文 | chi |
關鍵詞 | 電致色變; 磁控濺射; 三氧化鎢; Electrochromic; Pulsed sputter; Tungsten trioxide; |
中文摘要 | 氧化鎢薄膜是現在被廣泛使用的電致色變薄膜,但其在製程時容易形成不純的氧化鎢薄膜,導致鎢會以低價數鎢離子存在(W+5、W+4),本研究利用加入鈦離子的方式讓氧化鎢鈦薄膜可以得到高價數的鎢離子(W+6),鈦離子會以插入的方式存在氧化鎢薄膜裡與氧結合,鎢就可以高價數存在薄膜裡,使電致色變性質更佳。本研究使用磁控濺射以脈衝為電源,以鎢鈦合金靶為靶材,比較沉積出來的氧化鎢鈦薄膜光學性質。藉由XRD分析可以發現氧化鎢鈦薄膜為非晶質結構。SEM與AFM進行表面分析,隨著功率增加表面粗糙度增加。XPS分析鎢、鈦與氧的鍵結,薄膜中鎢主要以W+6價存在,而鈦以Ti+4價存在,表示在加入鈦之後能提高薄膜以高價數W+6價存在。在光學分析中鎢鈦合金靶在紅外光波段800nm之穿透率變化為64.22%,光學密度0.846。 |
英文摘要 | Tungsten oxide films were used popularly for electrochromic films, but it was easy to form tungsten oxide films impure when deposited. Tungsten would be existence at low price(W+4、W+5). This study is in order to get high price tungsten ions (W+6) so dope titanium ions into WTiOx films. Titanium ions will be integrated with oxide in WTiOx films by interstitial. Tungsten can be existed in WTiOx films at the high price, it is better to make the electrochromic properties. In this study uses a pulsed sputtering deposition system, tungsten-titanium alloy target to compare optical properties of WTiOx films. X-ray diffraction analysis, WTiOx films are amorphous structures. From the results of FE-SEM and AFM images, the roughness of WTiOx films increase as the pulsed power increase. XPS results shows W+6 and Ti+4 existed in films. The results means that dope titanium ions can get high price tungsten ions in the films. In the optics analysis, the WTiOx films of tungsten-titanium alloy target have transmittance variation (△T) 64.22% and optical density (△OD) 0.846 in infrared light wave. |
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