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頁籤選單縮合
題名 | 磁控濺鍍電漿製程之表面處理設備=Surface Treatment Equipment of Magnetron Sputter Plasma System |
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作者 | 張凱傑; 謝志男; 楊濟華; 李國義; |
期刊 | 機械工業 |
出版日期 | 20080700 |
卷期 | 304 2008.07[民97.07] |
頁次 | 頁82-90 |
分類號 | 472.16 |
語文 | chi |
關鍵詞 | 磁控濺鍍; 電漿表面處理設備; 物理氣相沉積設備; 批次處理設備; 捲式處理設備; Magnetron sputtering; Plasma surface treatment equipment; PVD; Physical vapor deposition; Batch type; Roll to roll type or web coater; |
中文摘要 | PVD設備為半導體、平面顯示器、工具五金、光學元件等產品之基本設備。近來在機械鍍膜方面為提昇切削刀具、機械零件及模具的使用壽命,使得金屬表面變質技術不斷的精進;由於真空鍍膜技術及電漿技術的進步,在提升材料表面機械性質方面,更能達到耐磨、耐腐蝕、美觀及延長使用壽命的要求。 |
英文摘要 | The Physical Vapor Deposition (PVD) equipment is one sort of the fundamental devices in production line of semiconductor、monitor display、cutting tools、machinery parts and optical components as well. Recently due to the PVD has increasingly improved surface treatment technology can be applied to metal material field in order to extend life cycle in cutting tool, machinery part and mold & dies. Since the progress of PVD and Plasma technology makes the requirement of quality in high level of wear-resistance, erosion resistance, beautifying appearance as well as tool life extension, more available than used to be. |
本系統之摘要資訊系依該期刊論文摘要之資訊為主。