頁籤選單縮合
題名 | Atomically Smooth Interface between Ultra-Thin Oxide and Si Substrate= |
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作者 | Hsieh, Ing Jar; Kao, Rong Huei; |
期刊 | Chung Hua Journal of Science and Engineering |
出版日期 | 20061200 |
卷期 | 4:4 民95.12 |
頁次 | 頁3-6 |
分類號 | 448.59 |
語文 | eng |
關鍵詞 | A leak-tight low-pressure oxidation system; Atomically smooth interface; |