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題名 | 雙光子吸收光致聚合技術應用於微元件製作之研究=Application of Two-Photon-Absorption Photopolymerization to Micro-Device Fabrication |
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作者 | 潘恩亞; 蒲念文; 董玉平; 游漢輝; | 書刊名 | 中正嶺學報 |
卷期 | 34:1 民94.11 |
頁次 | 頁57-74 |
分類號 | 448.59 |
關鍵詞 | 雙光子吸收; 光致聚合; 高深寬比; Two photon absorption; Photopolymerization; High aspect ratio; |
語文 | 中文(Chinese) |
中文摘要 | 本文中我們詳細報告應用雙光子吸收光於聚合技術製作微型柱、微型井、微型環諧振器、微型光柵等多種微元件。這些微元件係以聚焦之近紅外光飛秒級摻鈦藍寶石雷射在液態紫外光光致聚合樹脂中固化寫製。我們設計了一個新穎的方法:包含採用較小數值孔徑的聚值透鏡來造成更細長的了以快速單層寫製方式製作高深寬比、次繞射極限、次微米線寬之微結構的目標。 |
英文摘要 | In this article we report in detail the fabrication of micro-devices such as micro-rods, micro-wells, micro-ring oscillators, and micro-gratings using two-photon-absorption (TPA) photopolymerization. These micro-devices were written by solidifying liquid ultra-violet sensitive photophymerizable resins using a focused infrared femtosecond Ti: sapphire laser. Fabrication of high-aspect-ratio, sub-diffraction-limit, sub-micron micro-structures by fast, single-layer writing is achieved using a novel method, which combines the use of a moderate-numerical-aperture objective lens to obtain a much more elongated voxel, and an in-situ ultraviolet pre-exposure step to minimize the required time for subsequent TPA photopholymerization writing. |
本系統之摘要資訊系依該期刊論文摘要之資訊為主。